Welcome to MEMS and Micromachining Laboratory!

Combinatorial deposition method

Research Topics

 In this laboratory, extensive topics in micro-nano domains, such as MEMS, micromachining, evaluation for micro material and material creating, are covered and researched.

  • The leaflets including the summary of the most recent research topics can be find here.
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Combinatorial deposition method

 When searching for new materials, many samples with different compositions and fabricating conditions are prepared one by one and evaluated and the target material is searched for among all those samples. By combinatorial method, many samples with different compositions are fabricated at once on one substrate. This method is used to raise the efficiency and speed in searching for new materials.

Combinatorial new faced targets sputtering method

(Under construction)

Combinatorial arch plasma deposition method

This method uses arc plasma gun as the source of vapor deposition. We research on methods and devices for efficiently investigating the alloys made from 3 or more sources.

Schematic view of CAPD

Schematic view of Combinatorial Arch Plasma Deposition (CAPD)

Combinatorial arc plasma deposition method which used single arc plasma gun

We research on the method of generating a film with composition grading by using a single arc plasma gun and alloy cathode.

 Schematic view of combinatorial arc plasma deposition method which used single arc plasma gun

Schematic view of combinatorial arc plasma deposition method which used single arc plasma gun

Combinatorial sputter method

We research on the deposition methods, which use several simultaneous sputtering or targets with different ingredients (such as alloy targets) and their application in combinatorial search method.

Combinatorial MEMS process search

We use combinatorial sputtering method which involves using a movable mask and we research on MEMS process condition search method.

 Combinatorial MEMS process search

Combinatorial MEMS process search